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Fused silica is an amorphous (glassy) form of SiO2 (quartz). The material is rated very highly by experts in optical device manufacturing due to the favourable set of optical, chemical and mechanical properties. Fused silica is known for its excellent transmission in a broad spectrum from UV to IR, high stability in chemical substances and resistance to mechanical and thermal shocks. |
Refraction index at 293 K (20 ° C) | Nd = 1.4584 | Average variance at 293 K (20 ° C) | Nf - nc = 0.00677 | Dispersion factor at 293 K (20 ° C) | Vd = 67.83 | Refraction indices at other wavelengths | 302,150 nm - 1,487194 | | 404,656 nm - 1,469618 | | 656,272 nm - 1,456367 | | 852,111 nm - 1,452465 | Two surface reflection allowance | 400 nm - 0,032 | | 500 nm - 0,031 | | 1000 nm - 0,030 | Average thermooptical constant | 213 X 10-7 K -1 | Degree of blackness at 20 to 500 ° C | 0.93 | Thermal variations of reflection index at temperature increase by 1 deg | 102 X 10 -7 | Linear expansion coefficient at 50 ° C | 4 X 10 -7 | Specific heat at 20 ° C | 728 J/kg | Thermal conductivity at 20 ° C | 1,35 Watt/m | Annealing temperature | 1090 ° C | Deformation temperature | 1340 ° C | Melting temperature | 1700 ° C | Specific electrical resistance at 20 ° C | 1 X 10 20 Ohm * m | Loss tangent at frequency 9,5 X 10 9 | 1 X 10 -4 | Inductive capacity at frequency 9,5 X 10 9 | 3.8 | Disruptive electric strength | > 3,5 X 10 4 KV/m | Bending strength at 20 ° C | 39,2 MPa | Compression strength | 1080 MPa | Young modulus | 73,6 GPa | Shear modulus | 31,4 GPa | Poissont ratio | 0,17 - 0,19 | Density at 20 ° C | 2,21 g/ cm3 |
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Fused silica blanks and windows |
Diameter/Width | 12.7-101.6 +/-0.2 mm | Thickness/length | 2-12 +/-0.2 mm | Surface quality | As-cut, 80/50, 60/40 per MIL-0-13830 | Wedge | < 3' | Clear aperture | 90% |
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Fused silica optical prisms |
Length/Width | 5-25.4 +/-0.1 mm | Thickness/length | 5-25.4 +/-0.1 mm | Surface quality | 80/50, 60/40 per MIL-0-13830 | Corner tolerance | +/-10'' | Total surface error | λ / 5 |
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